Reliability wearout mechanisms in advanced CMOS technologies için kapak resmi
Reliability wearout mechanisms in advanced CMOS technologies
Başlık:
Reliability wearout mechanisms in advanced CMOS technologies
Yazar:
Strong, Alvin Wayne, 1946-
ISBN:
9780470455265
Fiziksel Niteleme:
1 PDF (xv, 624 pages) : illustrations.
Seri:
IEEE Press series on microelectronic systems ; 12
İçindekiler:
Introduction / Alvin W. Strong -- Dielectric characterization and reliability methodology / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Suñé -- Dielectric breakdown of gate oxides: physics and experiments / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Suñé -- Negative bias temperature instabilities in pMOSFET devices / Giuseppe LaRosa -- Hot carriers / Stewart E. Rauch, III -- Stress-induced voiding / Timothy D. Sullivan -- Electromigration / Timothy D. Sullivan.
Yazar Ek Girişi:
Elektronik Erişim:
Abstract with links to resource http://ieeexplore.ieee.org/xpl/bkabstractplus.jsp?bkn=5361029